窒化アルミニウム多結晶基板用研磨剤組成物および窒化アルミニウム多結晶基板の研磨方法

Title:

窒化アルミニウム多結晶基板用研磨剤組成物および窒化アルミニウム多結晶基板の研磨方法

Document Type and Number:

Japanese Patent JP6861063

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a polishing agent composition for an aluminum nitride substrate and a polishing method of an aluminum nitride substrate, for preparing an aluminum nitride substrate to have excellent surface smoothness at a high polishing speed.SOLUTION: A polishing agent composition for an aluminum nitride substrate includes an alumina particle, a dispersant, an acid, a hydrogen ion supply agent and water, and has a pH value (25°C) of 0.1 or more and less than 5.0. The hydrogen ion supply agent stably supplies a hydrogen ion at reduction of a hydrogen ion concentration in the polishing agent composition, and decreases fluctuation of pH even in polishing in an extended period. The hydrogen ion supply agent is selected from an inorganic acid salt and an organic salt.SELECTED DRAWING: None

Inventors:

Tadanori Nagao
Akihiro Kawahara

Application Number:

JP2017058042A

Publication Date:

April 21, 2021

Filing Date:

March 23, 2017

Export Citation:

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