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Title:
ABRASIVE LIQUID OR DRESSING LIQUID SUPPLY NOZZLE FOR POLISHING DEVICE AND POLISHING DEVICE
Document Type and Number:
Japanese Patent JP2000042905
Kind Code:
A
Abstract:

To simplify a structure, and to reliably supply an abrasive liquid or a dressing liquid without loss by fixing an abrasive liquid supply nozzle to a top ring head in a polishing device composed of a top ring and a turntable.

An abrasive liquid supply nozzle 10 is fixed to the outside surface of a top ring head 40. The abrasive liquid supply nozzle 10 is composed of thin piping, and is arranged so that a nozzle port 11 is positioned on the upper side of a rotary turntable 60 in the outer peripheral vicinity of a top ring 45. A fixing means 15 is composed of an elastic body by arranging a large number of recessed sandwiching parts in lateral one row, and can change a position of the nozzle port 11 by engaging the abrasive liquid supply nozzle 10 with either sandwiching part. A spiral tube 19 is arranged in the upper part to follow it when the top ring head 40 turns.


Inventors:
MASAKI MIKIHIKO
Application Number:
JP21257298A
Publication Date:
February 15, 2000
Filing Date:
July 28, 1998
Export Citation:
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Assignee:
EBARA CORP
International Classes:
B24B55/02; B24B37/00; (IPC1-7): B24B37/00; B24B55/02
Attorney, Agent or Firm:
Takashi Kumagai (1 outside)



 
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