Title:
ACTIVE MATRIX SUBSTRATE, DISPLAY APPARATUS PROVIDED WITH ACTIVE MATRIX SUBSTRATE, AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
Japanese Patent JP2008111936
Kind Code:
A
Abstract:
To provide an active matrix substrate favorably suppressing a warp of the substrate, film peeling, and crack, and to provide a display apparatus having the active matrix substrate and a manufacturing method therefor.
The active matrix substrate is provided with: a plastic substrate; a plurality of source lines formed on the plastic substrate; a plurality of gate lines crossing the plurality of source lines; and thin film transistors which are electrically connected to the source lines and the gate lines corresponding to each crossing at each crossings of the plurality of source lines and the plurality of gate lines, and a gate insulating film is formed only in the thin film transistors and lower part of the source lines.
Inventors:
OKABE TATSU
CHIKAMA YOSHIMASA
NISHIKI HIROHIKO
CHIKAMA YOSHIMASA
NISHIKI HIROHIKO
Application Number:
JP2006294044A
Publication Date:
May 15, 2008
Filing Date:
October 30, 2006
Export Citation:
Assignee:
SHARP KK
International Classes:
G09F9/30; G02F1/1345; G02F1/1368
Attorney, Agent or Firm:
Hiroshi Maeda
Yuji Takeuchi
Yuji Takeuchi
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