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Patent Searching and Data


Title:
ALIGNER AND EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2004311746
Kind Code:
A
Abstract:

To provide an aligner and an exposure method to which measures are taken to prevent a foreign substance from adhering to a reticle.

A reticle storage room 41 and a reticle transfer room 43 are provided with ion generators 61 and 67. The ion generators 61 and 67 spray a gas containing ions over a reticle 21 to be transferred from the reticle storage room 41 to a load lock room 45 through the reticle transfer room 43, and they ionize the gas around the reticle to destaticize the reticle 21. Thus, the static electricity of the reticle 21 can be released and a foreign substance floating in an atmospheric air is difficult to adhere to the reticle charged with static electricity.


Inventors:
OKADA MASASHI
Application Number:
JP2003103834A
Publication Date:
November 04, 2004
Filing Date:
April 08, 2003
Export Citation:
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Assignee:
NIKON CORP
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20