PURPOSE: To obtain the film having improved antireflection performance by irradiating a film with light simultaneously with quick heat-treatment, thereby forming a porous film composed mainly of silica and having a specific open pore ratio on a surface of a substrate.
CONSTITUTION: A sol solution is produced by dispersing a specific amount of superfine powder of an electrically conductive metal oxide selected from SnO2, ZnO and In2O3 in a sol solution produced by dissolving ethyl silicate, etc., in ethanol, etc. The obtained sol solution is applied to a quartz substrate 1 by spray-coating and quickly heated at a specific temperature simultaneously with the irradiation with light to form a porous SiO2 film 2 containing dispersed metal oxide and having an open pore ratio of ≥60% and obtain a high- performance antireflection film having antistatic function. A high-performance CRT can be produced by using the antireflection film as the non-glare film for CRT.
MAEKAWA SACHIKO
OISHI TOMOJI
TAKAHASHI KEN
NISHIZAWA SHOKO
