Title:
反射防止膜形成材料、およびこれを用いたレジストパターン形成方法
Document Type and Number:
Japanese Patent JP5324290
Kind Code:
B2
Abstract:
The anti-reflection film forming material according to the present invention includes (a) a water soluble resin having a vinyl acetate constituent unit, and (b) a compound having a constituent unit represented by the following general formula. Wherein, R1 and R2 represent a direct bond or a methylene chain; R3 and R4 represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or a group represented by —(CH2)n—O—R5—R6; and at least one of R3 and R4 is a group represented by —(CH2)n—O—R5—R6, wherein: R5 represents a direct bond or an alkylene chain having 1 to 10 carbon atoms which may be interrupted with —O—; R6 represents an alkyl group having 1 to 10 carbon atoms in which a portion or all hydrogen atoms are substituted with a fluorine atom; and n represents an integer of 0 to 10. Wherein, the total number of carbon atoms present in R1 and R2 is 1 or 2.
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Inventors:
Yuriko Shirai
Hiroko Hirosaki
Masahiro Masushima
Sawano Atsushi
Atsushi Koshiyama
Hiroko Hirosaki
Masahiro Masushima
Sawano Atsushi
Atsushi Koshiyama
Application Number:
JP2009084730A
Publication Date:
October 23, 2013
Filing Date:
March 31, 2009
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
C08K5/06; G03F7/11; C08K5/41; C08L29/04; C08L31/04; C08L39/06; H01L21/027
Domestic Patent References:
| JP2007219504A | ||||
| JP10069091A | ||||
| JP2006056139A | ||||
| JP2007114765A |
Attorney, Agent or Firm:
Masayuki Masabayashi