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Title:
APPARATUS AND METHOD FOR PLASMA TREATMENT
Document Type and Number:
Japanese Patent JP2005064120
Kind Code:
A
Abstract:

To provide an apparatus and a method for plasma treatment with which an object to be treated is prevented from causing metal contamination, even if the object is affected by high-density plasma, surface waves, electric fields, etc.

Gas supply pipes 5A and 5B, which are installed to the side wall of the chamber 1 of the plasma treatment device, are respectively disposed at positions sandwiching a gas-separating plate 2 which is provided in parallel with a dielectric window 9 separated from the window 9 in the chamber 1.


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Inventors:
ITA KOJI
YONEMOTO KIMIHIKO
Application Number:
JP2003290231A
Publication Date:
March 10, 2005
Filing Date:
August 08, 2003
Export Citation:
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Assignee:
SHIBAURA MECHATRONICS CORP
International Classes:
H01L21/3065; (IPC1-7): H01L21/3065
Attorney, Agent or Firm:
Norio Ohu
Takehana Kikuo
Hiroshi Uji



 
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