To prevent an uneven development due to a high-speed process and a scratch caused by contact with a guide plate.

The guiding surface of the guide plate 44 guiding a photosensitive sheet material 20S is composed of a wave plate portion 66 and a flat plate portion 68, and the boundary section between the portions is allocated at the position with a height of 1 to 4 mm above from the liquid surface of processing liquid. Thereby, the carrying property of the wave plate portion 66 is maintained, and a chemical agent is prevented from deposition and solicitation caused by adhesion of the processing liquid onto the guide surface produced by the fluctuation and jumping-up of the processing liquid. Because of a small friction factor, the processing liquid is flowed immediately, and the adhesion of the liquid onto the flat plate portion 68 does not occur. Thereby, very little chemical agent is deposited even if the liquid is left for a long period, and the occurrence of a scratch or the like caused by the solidification of the chemical agent can be prevented while the photosensitive sheet material 20S is carried thereon.