APPLYING SOLUTION FOR FORMING SILICA-BASED FILM AND FORMATION OF FILM

Japanese Patent JP3824334

B2

PROBLEM TO BE SOLVED: To obtain an applying solution for forming silica-based film with which a film having a highly flat surface can be formed by adding a quaternary ammonium salt compound to a solution composed of a resulted produce of hydrolysis composed of a mixture of a specific alkoxysilane compound and an organic solvent. SOLUTION: An applying solution for forming silica-based film which contains the resulted product obtained when the mixture of at least two of alkoxysilane compounds expressed by formulae I, II, and III is hydrolyzed under the presence of an acidic catalyst, an organic solvent, and a quaternary ammonium salt compound is prepared. Then a film is formed by applying the applying solution to a flat object W to be treated having projecting patterns 11, 12, and 13 with a rotary cup type coater. The rotation of the object W is performed in two stages of a first rotating stage in which the object W is rotated at a low speed and a second rotating stage in which the object W is rotated at a high speed and the time interval between the first rotation and second rotation is adjusted to 10 to 20 times as long as the duration of the first rotation. In addition, the duration of the second rotation is adjusted to 3 to 5 times of the duration of the first rotation and, in addition, to shorter than 2 seconds.