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Title:
BASE ISOLATION STRUCTURE
Document Type and Number:
Japanese Patent JP2010255776
Kind Code:
A
Abstract:

To provide a base isolation structure having sufficient damping performance and displacement following capability or having a repetitive characteristic in addition to the sufficient damping performance and displacement following capability.

The base isolation structure includes a laminate formed by alternately laminating first plates each formed of a rigid material and second plates each formed of an elastic material, and having a hollow portion extending in the laminating direction, and a plug filled in the hollow portion of the laminate. The plug is formed by compressing and molding powder materials for developing damping performance and elastomer compositions existing between the powder materials, and hard materials harder than the second plates are laid between the plug and at least the second plates of the laminate.


Inventors:
WAKANA YUICHIRO
Application Number:
JP2009000107922
Publication Date:
November 11, 2010
Filing Date:
April 27, 2009
Export Citation:
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Assignee:
BRIDGESTONE CORP
International Classes:
F16F15/04; F16F1/40
Domestic Patent References:
JP2008116041A2008-05-22
JP2006275215A2006-10-12
JP2008232190A2008-10-02
JPS63225739A1988-09-20
JP2001012545A2001-01-16
Attorney, Agent or Firm:
杉村 憲司
来間 清志
澤田 達也
冨田 和幸