Title:
BEAM HONOGENIZER AND LASER IRRADIATION APPARATUS AS WELL AS LASER IRRADIATION METHOD AND SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP3462053
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To ameliorate the unequal irradiation of a laser beam by splitting a laser beam and recombining these laser beams, thereby forming standing waves of a sinusoidal waveform on an irradiation surface.
SOLUTION: This beam homogenizer has the function to form the sinusoidal waveform on the irradiation surface by splitting the laser beam and recombining these laser beams. A cylindrical lens 501 plays a role of deviating the laser beams. If the number of the lenses of an cylindrical lens group 202 is odd, the cylindrical lens 501 is divided by (n'-1) and the lens groups divided by (n'-1) are merely necessitated to be deviated from each other by d/(n'-1) each. Here, n' is an integer existing within a range of 3≤n'≤n and (d) is the spacings between the interference patterns at the plane to be irradiated. As a result, the laser beams divided by the cylindrical lens group 203 are deviated from and superposed on each other with delicate positional relations and the laser beams made uniform in the interference state are obtd.
Inventors:
Koichiro Tanaka
Application Number:
JP28256697A
Publication Date:
November 05, 2003
Filing Date:
September 30, 1997
Export Citation:
Assignee:
Semiconductor Energy Laboratory Co., Ltd.
International Classes:
G02B27/09; H01L21/20; (IPC1-7): G02B27/09
Domestic Patent References:
| JP9275081A | ||||
| JP982605A | ||||
| JP311614A |
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