Title:
基盤処理装置
Document Type and Number:
Japanese Patent JP5355634
Kind Code:
B2
Abstract:
A substrate treatment system for treating substrates in a continuous process includes a system chamber delimited by chamber walls, having an entry lock and an exit lock, and also at least one substrate treatment device and a transportation device inside the system chamber. The transportation device has an arrangement of transportation rollers arranged one behind the other in the transportation direction, for vertical or horizontal transportation of substrates. The rotor of the drive device is arranged under the pressure conditions prevailing in the system chamber and the stator of the drive device is arranged outside the pressure conditions prevailing in the system chamber.
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Inventors:
Henrik Opst
Application Number:
JP2011152688A
Publication Date:
November 27, 2013
Filing Date:
July 11, 2011
Export Citation:
Assignee:
Huon Ardenne Anragen Tehinik Gezershyaft Mito Besilyenktel Haftung
International Classes:
H01L21/677; B65G49/07; H02K5/10; H02K7/14; H02K17/16
Domestic Patent References:
| JP62230513A | ||||
| JP2006237161A | ||||
| JP5011765U |
Foreign References:
| DE102005016406A1 | ||||
| DE102007052524A1 |
Attorney, Agent or Firm:
Mitsufumi Esaki
Blacksmith
Ryota Imamura
Kiyota Eisho
Blacksmith
Ryota Imamura
Kiyota Eisho