Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021011479
Kind Code:
A
Abstract:
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), and a resist composition containing the carboxylate.SOLUTION: The carboxylate represented by formula (I), a carboxylic acid generator, and the resist composition are provided. [In the formula, R1 represents an alkyl group; R2 represents a halogen atom or a fluorinated alkyl group; R3 and R4 each represent a halogen atom, a C1-6 fluorinated alkyl group or a C1-12 alkyl group; m3 represents an integer of 0-3; m4 represents an integer of 0-5; and X0 represents an optionally substituted hydrocarbon group, provided that -CH2- contained in the hydrocarbon group may be substituted with -O-, -S-, -CO- or -SO2-.]SELECTED DRAWING: None
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Inventors:
ADACHI YUKAKO
ARAKI KO
ICHIKAWA KOJI
ARAKI KO
ICHIKAWA KOJI
Application Number:
JP2020116533A
Publication Date:
February 04, 2021
Filing Date:
July 06, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C25/00; C07C62/24; C07D321/10; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation