Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021123580
Kind Code:
A
Abstract:
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), and a resist composition containing the same.SOLUTION: There are provided a carboxylate represented by formula (I), an acid generator, and a resist composition. [In the formula, R1 represents F or a C1-4 fluorinated alkyl group; R2-R4 each independently represent a halogen, a C1-4 fluorinated alkyl group, or a C1-12 hydrocarbon group in which -CH2- may be substituted with -O- or -CO-; m2 and m3 each represent an integer of 0-4; m4 represents an integer of 0-5; and X0 represents a C1-72 hydrocarbon group in which -CH2- may be substituted with -O-, -S-, -CO- or -SO2-.]SELECTED DRAWING: None
More Like This:
Inventors:
MASUYAMA TATSURO
ADACHI YUKAKO
ICHIKAWA KOJI
ADACHI YUKAKO
ICHIKAWA KOJI
Application Number:
JP2021003519A
Publication Date:
August 30, 2021
Filing Date:
January 13, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C62/24; C07C65/10; C07C381/12; C07D321/10; C07D493/08; C09K3/00
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation