Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022164584
Kind Code:
A
Abstract:
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.SOLUTION: There are provided a carboxylate represented by a specific formula, a carboxylic acid generator, and a resist composition containing the same.SELECTED DRAWING: None

More Like This:
JP2005037777POSITIVE RESIST COMPOSITION
WO/2013/161616COLOR MATERIAL DISPERSION FOR COLOR FILTER, COLORED RESIN COMPOSITION FOR COLOR FILTER, COLOR FILTER, LIQUID-CRYSTAL DISPLAY DEVICE, AND ORGANIC LIGHT-EMITTING DISPLAY DEVICE
JPH04223466PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE
Inventors:
KOMURO KATSUHIRO
ICHIKAWA KOJI
Application Number:
JP2022054439A
Publication Date:
October 27, 2022
Filing Date:
March 29, 2022
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C07C62/24; C07C381/12; C07D321/06; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation



 
Previous Patent: Salt, acid generator, resist composition and method for producing resist pattern

Next Patent: Salt, acid generator, resist composition and method for producing resist pattern