Title:
カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7414407
Kind Code:
B2
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity.SOLUTION: A carboxylate is represented by formula (I) [where Rrepresents a fluorine atom or a C1-6 perfluoroalkyl group; n1 represents an integer of 1-5; Rrepresents a C1-6 alkyl group which may have a fluorine atom, or the like; n2 represents an integer of 0-5; Rrepresents a halogen atom, a C1-6 alkyl group, or the like; and n3 represents an integer of 0-5].SELECTED DRAWING: None
Inventors:
Yukako Adachi
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2019106424A
Publication Date:
January 16, 2024
Filing Date:
June 06, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C63/70; C07C25/13; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2004219963A | ||||
| JP2007114431A | ||||
| JP2005091713A | ||||
| JP2019003176A | ||||
| JP2018136527A | ||||
| JP2018043952A | ||||
| JP2006309186A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP
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