Title:
CHAMBER FOR THERMAL TREATMENT EQUIPMENT, AND THERMAL TREATMENT EQUIPMENT
Document Type and Number:
Japanese Patent JP2015025623
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To reduce labor required for manufacture, even in the case of a large-type chamber for thermal treatment equipment.SOLUTION: A chamber 4 for thermal treatment equipment 1 includes a cylindrical side wall 12 for surrounding an article to be treated, and an end wall 13 for closing one opening 12b of the side wall 12. In the chamber 4, a plurality of members (a side wall 12, an end wall 13, a first connection member 14, and a second connection member 15) predominantly composed of a silicon oxide are formed by being mechanically connected together.
Inventors:
KASATSUGU KATSUNAO
NISHIMURA KEISUKE
URASAKI YOSHIHIKO
MORIKAWA KIYOHIKO
NAKANISHI HIRONARI
NISHIMURA KEISUKE
URASAKI YOSHIHIKO
MORIKAWA KIYOHIKO
NAKANISHI HIRONARI
Application Number:
JP2013155916A
Publication Date:
February 05, 2015
Filing Date:
July 26, 2013
Export Citation:
Assignee:
KOYO THERMO SYS KK
International Classes:
F27B5/04; F27B5/10
Domestic Patent References:
| JPH01289254A | 1989-11-21 | |||
| JP2009524243A | 2009-06-25 | |||
| JP2011527729A | 2011-11-04 | |||
| JP2000000147A | 2000-01-07 | |||
| JPH01184387A | 1989-07-24 |
Foreign References:
| US4897140A | 1990-01-30 | |||
| US20020170487A1 | 2002-11-21 |
Attorney, Agent or Firm:
Patent business corporation Wang Dee IP partners