Title:
CHEMICAL VAPOR DEPOSITION TREATMENT SYSTEM
Document Type and Number:
Japanese Patent JP2004003026
Kind Code:
A
Abstract:
To move a work to the inside and outside of a reactor, and to facilitate the treatment of the work therein by a CVD (Chemical Vapor Deposition) method.
The CVD treatment system for a work is provided with a conveyer means, and at least one reactor fixed to the conveyer means. The system has at least one machine control cam. The reactor has an opening and closing means worked with at least one control cam.
Inventors:
ARNOLD GREGOR
BEHLE STEPHAN
LUTTRINGHAUS-HENKEL ANDREAS
BICKER MATTHIAS
BEHLE STEPHAN
LUTTRINGHAUS-HENKEL ANDREAS
BICKER MATTHIAS
Application Number:
JP2003147768A
Publication Date:
January 08, 2004
Filing Date:
May 26, 2003
Export Citation:
Assignee:
ZEISS STIFTUNG
International Classes:
B08B7/00; B08B9/42; B29C49/42; B65D23/02; B65D23/08; B65G29/00; C03C17/00; C08J9/00; C23C14/04; C23C14/50; C23C14/56; C23C16/04; C23C16/40; C23C16/44; C23C16/455; C23C16/458; C23C16/50; C23C16/511; C23C16/515; C23C16/54; B05D7/24; (IPC1-7): C23C16/44; B65D23/02; B65D23/08; C23C16/511; C23C16/515; C23C16/54
Domestic Patent References:
| JPH08509166A | 1996-10-01 | |||
| JPH08508964A | 1996-09-24 | |||
| JPS57121246A | 1982-07-28 | |||
| JPH06338469A | 1994-12-06 | |||
| JPH02129375A | 1990-05-17 |
Foreign References:
| WO2001031680A1 | 2001-05-03 |
Attorney, Agent or Firm:
Masao Okabe
Nobuaki Kato
Kazuo
Shinichi Usui
Ikuo Fujino
Takao Ochi
Teruhisa Motomiya
Norimichi Takanashi
Asahi Shinmitsu
Seiichiro Takahashi
Koji Yoshizawa
Takao Matsui
Nobuaki Kato
Kazuo
Shinichi Usui
Ikuo Fujino
Takao Ochi
Teruhisa Motomiya
Norimichi Takanashi
Asahi Shinmitsu
Seiichiro Takahashi
Koji Yoshizawa
Takao Matsui