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Title:
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, (METH)ACRYLATE DERIVATIVE AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2011046713
Kind Code:
A
Abstract:

To provide a resist composition having good line edge roughness and a chemically amplified positive resist composition wherein the pattern is miniaturized in a reflow step.

This invention provides a radiation-sensitive composition which comprises a resin comprising a repeating unit of formula (I) and at least one repeating unit selected from the group consisting of repeating units of formulas (II), (III), (IV) and (V) and an acid generator.


Inventors:
TAKEMOTO KAZUKI
YOSHIDA ISAO
MIYAGAWA TAKAYUKI
Application Number:
JP2010202796A
Publication Date:
March 10, 2011
Filing Date:
September 10, 2010
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D307/33; C08F20/28; G03F7/039
Domestic Patent References:
JP2000267287A2000-09-29
JP2000347409A2000-12-15
JP2004264478A2004-09-24
JP2005031539A2005-02-03
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto



 
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