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Patent Searching and Data


Title:
CLEANING DEVICE AND CLEANING METHOD
Document Type and Number:
Japanese Patent JP2010279947
Kind Code:
A
Abstract:

To provide a cleaning device suitable for removing the deposit of flux produced in a soldering stage and a resin film such as the photoreceptor layer of an OPC drum used in an image forming apparatus or the release layer of a fixing roller, although a device has already been proposed, which removes a deposit adhering to an object to be cleaned by using a solid cleaning medium without using water nor a solvent.

Using a flake-like cleaning medium M having greater pencil hardness than the resin film of a cleaning object and by causing the medium to fly by a high-speed air-flow and to collide with the object, the cleaning medium M bites into the film like deposit in spite of a small mass, since the film like deposit is easier to be dented and contact force is concentrated on the end of the cleaning medium M. As a result, it improves cleaning of a component of a complicated shape, removal of a film like deposit, or cleanliness of the cleaning medium, so that the cleaning quality is enhanced.


Inventors:
SATO TATSUYA
OKAMOTO YOICHI
FUCHIGAMI AKIHIRO
TANEDA YUSUKE
Application Number:
JP2010178191A
Publication Date:
December 16, 2010
Filing Date:
August 06, 2010
Export Citation:
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Assignee:
RICOH CO LTD
International Classes:
B08B5/02; B08B1/02; B08B5/00; B08B9/38; G03G15/00; G03G21/00
Domestic Patent References:
JP2007029945A2007-02-08
JPH02208486A1990-08-20
Attorney, Agent or Firm:
Shogo Honda
Toru Kabayama
Shuichi Kudo