Title:
CLEANING METHOD OF DEPOSITION FILM FORMATION DEVICE
Document Type and Number:
Japanese Patent JP2014210971
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To perform efficiently and inexpensively a cleaning treatment of the inner part of a deposition film formation device after forming a deposition film.SOLUTION: A cleaning method of the inner part of a deposition film formation device for forming sequentially a deposition film comprising an amorphous material containing silicon atoms and hydrogen atoms and a deposition film comprising an amorphous material containing at least carbon atoms and silicon atoms includes a first cleaning step for performing a cleaning treatment, while continuing supply of first cleaning gas and high-frequency power, and a second cleaning step for performing a cleaning treatment by sealing second cleaning gas inside the deposition film formation device.
Inventors:
OKAMURA TATSUJI
YAMADA MOTOYA
YAMADA MOTOYA
Application Number:
JP2013089104A
Publication Date:
November 13, 2014
Filing Date:
April 22, 2013
Export Citation:
Assignee:
CANON KK
International Classes:
C23C16/44; G03G5/08
Attorney, Agent or Firm:
Kenji Katsurada
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