CLEANING METHOD - KAWASAKI MICROELECTRONICS KK

Title:

CLEANING METHOD

Document Type and Number:

Japanese Patent JP2003234321

Kind Code:

A

Abstract:

To separate only foreign objects adhering on the surface of a film without peeling a film on the surface for a cleaning method for cleaning the surface of a substrate to be cleaned by spraying to the surface to be cleaned cleaning liquid given with specific energy.

In the cleaning method for cleaning the surface of a substrate W to be cleaned, the substrate W to be cleaned where at least one film is formed on the surface is retained on a substrate table 11, the surface film is sprayed with cleaning liquid given with specific energy from a nozzle 12 that is allowed to approach the film of the surface in the substrate W to be cleaned retained on the substrate base 11, and at the same time, the distance between the film of the surface and the nozzle 12 is changed according to a position on the surface of the substrate W to be cleaned.

Inventors:

HIRAOKA SATORU

Application Number:

JP2002029475A

Publication Date:

August 22, 2003

Filing Date:

February 06, 2002

Export Citation:

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Assignee:

KAWASAKI MICROELECTRONICS KK

International Classes:

B08B3/02; B08B3/12; H01L21/304; (IPC1-7): H01L21/304; B08B3/02; B08B3/12

Attorney, Agent or Firm:

Yoshio Kosugi (1 person outside)

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Next Patent: ULTRASONIC TREATMENT APPARATUS FOR SUBSTRATE AND ULTRASONIC TREATMENT METHOD