To provide a coating liquid for forming an intermediate layer of a multilayer resist, the coating liquid having high dry etching durability, causing no mixing or dissolution with other layers, and capable of preventing a stationary wave effect by UV absorption, and to provide a method for forming a pattern using the coating liquid.

The coating liquid for forming an intermediate layer of a multilayer resist essentially comprises a metal alkoxide derivative expressed by M(OR1)a or R2bM(OR3)c, wherein M represents a metal atom, each of R1, R2 and R3 represents a 1-8C alkyl group, a is the valence of M, b and c are integers and the sum b+c is the valence of the metal atom M, and is dissolved in an organic solvent. M is preferably Ti. After the coating liquid is applied on a substrate, the liquid is baked in an inert gas atmosphere at 100°C to 250°C to solidify to obtain an intermediate layer of a multilayer resist.