Title:
マイクロリソグラフィー用組成物
Document Type and Number:
Japanese Patent JP2004512396
Kind Code:
A
Abstract:
A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1'-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containing a functional group containing the structure: -C(Rf)(Rf')Orb wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is an integer ranging from 2 to about 10 and Rb is a hydrogen atom or an acid- or base-labile protecting group; r is an integer ranging from 0-4. The fluorine-containing polymer has an absorption coefficient of less than 4.0 mm-<1> at a wavelength of 157 nm. These polymers are useful in photoresist compositions for microlithography. They exhibit high transparency at this short wavelength and also possess other key properties, including good plasma etch resistance and adhesive properties.
Inventors:
Larry El. Burger
Michael Karl Crawford
Gerald Feldman
Linda Kay Johnson
Frank El. Shad the Third
Fredrick Klaus Zamsteg Jr.
Michael Karl Crawford
Gerald Feldman
Linda Kay Johnson
Frank El. Shad the Third
Fredrick Klaus Zamsteg Jr.
Application Number:
JP2002536611A
Publication Date:
April 22, 2004
Filing Date:
October 16, 2001
Export Citation:
Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
C08F232/00; C08F232/08; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): C08F232/00; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Yoshikazu Tani
Kazuo Abe
Kazuo Abe