Title:
濃度制御装置及び材料ガス供給装置
Document Type and Number:
Japanese Patent JP7154850
Kind Code:
B2
Abstract:
To provide a concentration control device capable of shortening a pipeline and improving response without deteriorating maintainability.SOLUTION: A concentration control device introduces carrier gas to a storage tank for storing a material, and controls a concentration of material gas obtained by evaporating the material introduced as mixture gas with the carrier gas from the storage tank. The device comprises a first unit 210 connected to an introduction pipe 11, and having a function for controlling a flow rate of carrier gas supplied to a storage tank ST via the introduction pipe 11 from a carrier gas supply device, and a second unit 220 connected to a delivery pipe 12, and detecting the concentration of the material gas contained in the mixture gas supplied to a supply destination via the delivery pipe 12 from the storage tank ST. The concentration control device is constituted by combining block elements such as the first unit 210 and the second unit 220.SELECTED DRAWING: Figure 1
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Inventors:
Toshi Shimizu
Masakazu Minami
Masakazu Minami
Application Number:
JP2018132341A
Publication Date:
October 18, 2022
Filing Date:
July 12, 2018
Export Citation:
Assignee:
HORIBA STEC Co., Ltd.
International Classes:
C23C16/52; C23C16/455; F17C13/02; G05D21/00; H01L21/205; H01L21/31
Domestic Patent References:
| JP2012197941A | ||||
| JP2008231515A | ||||
| JP2008047600A |
Foreign References:
| WO2016080532A1 |
Attorney, Agent or Firm:
Nishimura Ryuhei
Shindai Saito
Yoshinaga Uemura
Shindai Saito
Yoshinaga Uemura