PURPOSE: To make it possible to form a deposition region of a large volume, to move many substrates through the deposition region and to simultaneously stagnate the many substrates within the deposition region.
CONSTITUTION: A substrate holder 25 is arranged in the deposition region 24 of the vacuum film forming apparatus for the substrates. Magnetron cathodes 7, 8 are arranged on both sides of the holder. Targets 18, 19 of these magnetron cathodes 7, 8 are oriented to the deposition region 24. The negative impartation of the magnetron cathodes 7, 8 to the magnetic systems 12, 13 is so selected that the respective poles of reverse polarities face each other on both sides of the deposition region 24. The side opposite to the deposition region 24 is provided with magnetic coils 21, 22. The respective fields of these magnetic coils complement each other to form one closed magnetic field. The polar positions or the permanent magnet systems 12, 13 and the outer electrodes 16, 17 of the magnetic coils 21, 22 are in the same direction.
HANSU SHIYUSURAA
ARUBERUTO FUOIAASHIYUTAIN
| JPS63277756A | 1988-11-15 | |||
| JPH02240261A | 1990-09-25 | |||
| JPS60106966A | 1985-06-12 |