To obtain movement order of a substrate stage and scanning directions of respective shots on a substrate that are advantageous in terms of throughput of a scanning aligner.
An initial position of the substrate stage of the scanning aligner, a plurality of measurement positions for measuring a plurality of measurement points on a substrate held by the substrate stage, a plurality of exposure positions for exposing the plurality of shots on the substrate, and the order of sequential movement of a final position of the substrate stage to the substrate stage and the respective scanning directions of the plurality of shots are determined using a solution of a traveling salesman problem formulated under settings of a predetermined node and movement cost.
| JPS62213256 | MANUFACTURE OF SEMICONDUCTOR DEVICE |
| WO/2018/057499 | SPACER FORMATION FOR SELF-ALIGNED MULTI-PATTERNING TECHNIQUE |
TAKAKURA SHIN
FUKAGAWA YOZO
UNIV TOKYO AGRICULTURE
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu