Title:
DEVICE FOR TREATING PHOTOGRAPHIC PROCESSING WASTE LIQUID
Document Type and Number:
Japanese Patent JP2627255
Kind Code:
B2
Abstract:
PURPOSE: To easily treat vapor generated with the treatment of photographic processing waste liquid by installing a fluororesin and others as a means for preventing the photographic processing waste liquid from being stuck in at least part of a treating chamber for the photographic processing waste liquid.
CONSTITUTION: A means for preventing photographic processing waste liquid from being stuck is installed in at least part of a treating chamber for the photographic processing waste liquid. As the means for preventing the sticking, a compound selected from the following group consisting of: A, fluororesin; B, silicone oil, C, remover, and D, inorganic fiber. For example, in an automatic developing machine 10, a replenishing liquid is fed to each treating tank from each replenishing liquid tank 11, controlled by a controller 20, and also a waste liquid overflowing each treating tank is collected in a stock tank 30 and treated by a treating means 40. In this case, the inner surface of a treating chamber 42 storing the waste liquid undergoes, for example, Teflon processing (fluororesin coating) as a means 44 for preventing the waste liquid from being stuck. In this way, vapor is easily treated.
Inventors:
Satoshi Kuze
Yoko Matsushima
Shozo Aoki
Shigeharu Koboshi
Yoko Matsushima
Shozo Aoki
Shigeharu Koboshi
Application Number:
JP22339694A
Publication Date:
July 02, 1997
Filing Date:
September 19, 1994
Export Citation:
Assignee:
Konica Corporation
International Classes:
G03C5/00; C02F1/04; G03C11/00; G03D3/00; (IPC1-7): C02F1/04; G03C5/00; G03C11/00; G03D3/00
Domestic Patent References:
| JP5747289U |
Other References:
用水廃水便覧編集委員会編「改訂二版 用水廃水便覧」昭和５１年６月１５日丸善株式会社発行、第６５６−６５８頁
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