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Title:
蒸着金属酸化物含有ハードマスクのＥＵＶフォトパターニング
Document Type and Number:
Japanese Patent JP7282830
Kind Code:
B2
Abstract:
A vacuum-integrated metal oxide-containing hardmask formation process and related vacuum-integrated hardware that combine steps of film formation by vapor deposition and optical lithography results in direct photopatterning of metal oxide-containing hardmasks at substantially reduced cost relative to current approaches.

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Inventors:
David Charles Smith
Dennis M. Hausman
Application Number:
JP2021102822A
Publication Date:
May 29, 2023
Filing Date:
June 22, 2021
Export Citation:
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Assignee:
LAM RESEARCH CORPORATION
International Classes:
G03F7/004; G03F7/20
Domestic Patent References:
JP2019500490A
Attorney, Agent or Firm:
Patent Attorney Corporation Meisei International Patent Office



 
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