Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ELECTRON BEAM DEPOSITION SYSTEM
Document Type and Number:
Japanese Patent JPH1088331
Kind Code:
A
Abstract:

To provide an electron beam deposition system capable of preventing the breaking of a crucible even if the irradiating position of an electron beam is deviated.

The circumferential part of the recessed part 1a of a crucible 1 is provided with an electron beam detector 4 composed of high m.p. metal such as tungsten via an insulator 9. The electron beam detector 4 is grounded via a current measuring section 5. The current measuring section 5 is connected to an interlock control section 6, and the interlock control section 6 is connected to a filament current control section 3. The current I flowing through the electron beam detector 4 is measured at the current measuring section 5, and the measured value signal S1 is compared with prescribed standard value at the interlock control section. When the measured value signal S1 exceeds the prescribed standard value, the filament current control section 3 stops the energization to a filament 2 based on the control signal S2 outputted from the interlock control section 6.


Inventors:
FURUICHI NORIYOSHI
Application Number:
JP26136596A
Publication Date:
April 07, 1998
Filing Date:
September 10, 1996
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SONY CORP
International Classes:
C23C14/30; H01L21/203; (IPC1-7): C23C14/30; H01L21/203
Attorney, Agent or Firm:
Masatomo Sugiura