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Title:
VAPOR DEPOSITION METHOD AND APPARATUS THEREFOR
Document Type and Number:
Japanese Patent JPH1088329
Kind Code:
A
Abstract:

To provide an improved vapor deposition method which substantially and uniformly deposits an extremely small amt. of evaporatable material on a base body and a vapor deposition apparatus therefor.

The supply of the evaporatable material having the thermal equil. and phase equil. with satd. steam existing at a first temp. is maintained in a first zone 12 and the vapor is withdrawn into a second zone 16 in the vapor deposition method of depositing the extremely small amt. of the evaporatable material on the base body. The temp. of the vapor in the second zone 16 is regulated to the second temp. higher than the first temp. and the vapor is sent to a third zone 18. The base body 20 having the third temp. lower than the first temp. is transferred through the third zone 18. While this transfer is executed, the vapor is partly condensed on the base body 20 to form a condensate. While the condensation is executed, the temp. of the base body 20 is substantially increased up to the first temp.


Inventors:
FRANK LEE F
BARON ROBERT JOHN
TRAIN ROBERT MICHAEL
Application Number:
JP15558897A
Publication Date:
April 07, 1998
Filing Date:
June 12, 1997
Export Citation:
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Assignee:
EASTMAN KODAK CO
International Classes:
G03C11/00; C23C14/24; G03C1/74; (IPC1-7): C23C14/24; G03C11/00
Attorney, Agent or Firm:
Masatake Shiga (6 people outside)