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Title:
ELECTRON BEAM EQUIPMENT
Document Type and Number:
Japanese Patent JP2007048806
Kind Code:
A
Abstract:

To reduce oscillation or ringing of deflection voltage.

The electron beam equipment comprises a blanking deflector 212 arranged in an electronic mirror cylinder 102 and deflecting an electron beam 200, an amplifier 262 arranged on the outside of the electronic mirror cylinder 102 and applying a voltage to the blanking deflector 212 through a coaxial cable 242 extending to the electronic mirror cylinder 102, and a resistor 232 arranged between the electronic mirror cylinder 102 and the coaxial cable 242 and connected with wiring for applying a voltage to the blanking deflector 212. Since the undulation component of ringing can be attenuated by matching the deflector and a voltage applying section, ringing and oscillation are reduced and response characteristics can be enhanced. As a result, precision of deflection can be enhanced and oscillation in beam position can be suppressed. Consequently, deterioration in beam resolution on the image plane can be suppressed.


Inventors:
TAMAMUSHI SHUICHI
Application Number:
JP2005229169A
Publication Date:
February 22, 2007
Filing Date:
August 08, 2005
Export Citation:
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Assignee:
NUFLARE TECHNOLOGY INC
International Classes:
H01L21/027; G03F7/20; H01J37/147; H01J37/305
Domestic Patent References:
JPH03167923A1991-07-19
JPH0773835A1995-03-17
JPH11329323A1999-11-30
JPH0240850A1990-02-09
JPS632239A1988-01-07
JPH08335547A1996-12-17
JP2000133183A2000-05-12
JPH11176719A1999-07-02
JP2002198294A2002-07-12
JPS62119845A1987-06-01
JPH11273603A1999-10-08
JPH03252034A1991-11-11
Attorney, Agent or Firm:
Mitsuyuki Matsuyama
Yuichi Kasai
Tetsuma Ikegami



 
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