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Title:
ELECTRON BEAM IRRADIATION SYSTEM
Document Type and Number:
Japanese Patent JP2004290261
Kind Code:
A
Abstract:

To provide an electron beam irradiation system which can perform a highly efficient electron beam irradiation process to a plurality of fluids having different contents of a contained reactant which flow in a flowing passage.

This electron beam irradiation system is equipped with a duct 14 in which a plurality of fluid air streams having different contents of contained viable cell count microbes, and an electron beam irradiation apparatus 3 which is arranged in a manner to be closely joined to the duct 14 and irradiates a plurality of the fluids existing in an irradiation objective region 11 in the duct 14 with an electron beam 15. At the same time, on the upstream side of the irradiation objective region 11, a partitioning plate 17 which makes the external air 7 having a relatively larger content of the contained viable cell count microbes circulate to be closer to an injection unit of the electron beam 15 than re-circulating air 10 having a smaller content of the contained viable cell count microbes is arranged to constitute the electron beam irradiation system.


Inventors:
URANO SUSUMU
WAKAMOTO IKUO
YAMAKAWA TAKASHI
Application Number:
JP2003083374A
Publication Date:
October 21, 2004
Filing Date:
March 25, 2003
Export Citation:
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Assignee:
MITSUBISHI HEAVY IND LTD
International Classes:
G21K5/04; A61L9/18; B01J19/12; F24F1/00; F24F7/06; F24F13/02; G21K5/10; (IPC1-7): A61L9/18; B01J19/12; F24F1/00; F24F7/06; F24F13/02; G21K5/04; G21K5/10