Title:
ELECTRON-BEAM TUBE DEVICE AND ELECTRON-BEAM EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2005244105
Kind Code:
A
Abstract:
To provide an electron-beam tube device capable of improving the resolution of an exposure pattern by shortening the range of electron beams while maintaining the size of a maximum deflection region scanned by electron beams.
The electron-beam tube device 10 is constituted by arranging sub-deflectors 51 and 52 deflecting electron beams 15 so that electron beams 15 are projected to a mask 30 at a specified incident angle between a pair of main deflectors 21 and 22 deflecting electron beams 15 generated from an electron-beam source 14 as the beam optical axis 19 of electron beams is kept in parallel.
Inventors:
KASAHARA HARUO
KAWAMURA YUKISATO
SHISHIDO TSUTOMU
KAWAMURA YUKISATO
SHISHIDO TSUTOMU
Application Number:
JP2004055025A
Publication Date:
September 08, 2005
Filing Date:
February 27, 2004
Export Citation:
Assignee:
TOKYO SEIMITSU CO LTD
RIIPURU KK
RIIPURU KK
International Classes:
G21K1/00; G03F7/20; G21K1/093; G21K5/04; H01J37/147; H01J37/305; H01L21/027; (IPC1-7): H01L21/027; G03F7/20; G21K1/00; G21K1/093; G21K5/04; H01J37/147; H01J37/305
Attorney, Agent or Firm:
Atsushi Aoki
Jun Tsuruta
Tetsuro Shimada
Ryu Kobayashi
Masaya Nishiyama
Jun Tsuruta
Tetsuro Shimada
Ryu Kobayashi
Masaya Nishiyama