To provide an exposure device wherein workability for searching again a mark of a wafer is improved and to provide a program of the exposure device and a device manufacturing method using the exposure device.

The exposure device has a display part 123 of a computer terminal 121, which displays an image in respective images of a display picture control part 125 detecting alignment marks of a mask and a wafer from respective images of an A scope 105 and a B scope 106 for detecting the alignment marks of the mask and the wafer and a display picture 127 being an alignment mark search operation means driving at least a mask stage 102 or a wafer stage 104. One synthesized taken image obtained by combining the images in accordance with at least one image taking position of the mask stage 102 and the wafer stage 104 is displayed on the display picture 127.