Title:
EXPOSURE DEVICE AND EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2014036108
Kind Code:
A
Abstract:
To solve a problem such that a plasmonic lens is adhered on a substrate and so a degree of freedom of a pattern is small.
The exposure device for exposing an exposed member comprises: a light output part for outputting light; a reticle on which a pattern for radiating the light is formed; a lens member to which the light passing through the reticle is radiated and on which plural plasmonic lenses for outputting a pattern of a near-field light obtained by reducing the pattern are aligned; and a first driving part for driving, in a first driving direction, at least one of the reticle, the lens member and the exposed member to the other member.
Inventors:
OKUHIRA YOSUKE
Application Number:
JP2012176391A
Publication Date:
February 24, 2014
Filing Date:
August 08, 2012
Export Citation:
Assignee:
NIKON CORP
International Classes:
H01L21/027; G02B3/00; G02B19/00
Attorney, Agent or Firm:
Longhua International Patent Service Corporation