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Title:
EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS
Document Type and Number:
Japanese Patent JP2010021543
Kind Code:
A
Abstract:

To provide an EUV light source apparatus using a spectrum purity filter for obtaining high spectrum purity EUV light.

The EUV light source apparatus includes: a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for radiating a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam radiated by the driver laser.


Inventors:
MORIYA MASATO
ABE TAMOTSU
SUGANUMA TAKASHI
ENDO AKIRA
SUMIYA AKIRA
WAKABAYASHI OSAMU
Application Number:
JP2009141103A
Publication Date:
January 28, 2010
Filing Date:
June 12, 2009
Export Citation:
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Assignee:
KOMATSU MFG CO LTD
GIGAPHOTON INC
International Classes:
H01L21/027; H05G2/00
Domestic Patent References:
JP2000098094A2000-04-07
JP2006191090A2006-07-20
JP2006279036A2006-10-12
JPH0743526A1995-02-14
JP2003008124A2003-01-10
JP2000186958A2000-07-04
JP2004258670A2004-09-16
JP2007128087A2007-05-24
JP2004103773A2004-04-02
JP2007129209A2007-05-24
JP2008085292A2008-04-10
Foreign References:
US20030058529A12003-03-27
US6522465B12003-02-18
US20070170379A12007-07-26
Attorney, Agent or Firm:
Masaaki Utsunomiya
Atsushi Watanabe
Mutsumi Yanase



 
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