Title:
FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD
Document Type and Number:
Japanese Patent JP2014141706
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To prevent a substrate from moving onto a roller or sliding without using a free roller.SOLUTION: A film deposition apparatus includes: a substrate transporting mechanism which transports a substrate S by a plurality of rollers 410 arranged in a transporting direction; a film deposition part 200 which performs film deposition processing while transporting the substrate at a constant film deposition speed by the substrate transporting mechanism; a substrate carrying-in part 110; a substrate carrying-out part 160; a carrying-in speed adjustment part 130; a carrying-out speed adjustment part 140; and a control part 300 which performs control so that rollers on which one substrate is put all rotate synchronously with the same speed control pattern by performing driving control over a plurality of rollers provided at one or both of the carrying-in speed adjustment part and carrying-out speed adjustment part by changing predetermined speed control patterns for each transported substrate.
Inventors:
NISHIMURA MASARU
Application Number:
JP2013010323A
Publication Date:
August 07, 2014
Filing Date:
January 23, 2013
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
C23C14/56; H01L51/50; H05B33/10
Attorney, Agent or Firm:
Hiroaki Oyama
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