Title:
FILM DEPOSITION APPARATUS, METHOD FOR DEPOSITING FILM AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
Japanese Patent JP2023121377
Kind Code:
A
Abstract:
To suppress variation in transportation height of a substrate carrier due to variation in weight on a film deposition apparatus that transports a substrate carrier while floating the substrate carrier with magnetic force and deposits a film.SOLUTION: An in-line type film deposition apparatus that deposits a film while transporting a substrate includes: a substrate carrier for holding the substrate; magnetic force generation means for generating magnetic force to magnetically float the substrate carrier; and position change means for changing a vertical position of the magnetic force generation means.SELECTED DRAWING: Figure 2
Inventors:
NAGATA TETSUYA
EZAWA MITSUHARU
AOKI TAIICHIRO
EZAWA MITSUHARU
AOKI TAIICHIRO
Application Number:
JP2022024688A
Publication Date:
August 31, 2023
Filing Date:
February 21, 2022
Export Citation:
Assignee:
CANON TOKKI CORP
International Classes:
C23C14/50; H01L21/677; H05B33/10; H10K50/10
Attorney, Agent or Firm:
Patent Attorney Corporation Shuwa Patent Office
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