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Title:
FILM PATTERN FORMING METHOD, FILM PATTERN, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING ELECTROOPTIC DEVICE, AND ELECTROOPTIC DEVICE
Document Type and Number:
Japanese Patent JP2003162058
Kind Code:
A
Abstract:

To efficiently form a molecular film pattern using a molecular film having excellent photodegradability.

A molecular film 12 is formed using a compound having a chemical structure represented by formula (14) as starting material and this molecular film 12 is irradiated with ultraviolet light of 308 nm wavelength through a photomask 13.


Inventors:
MIYAZAWA TAKASHI
ISHIDA MASAYA
Application Number:
JP2001362743A
Publication Date:
June 06, 2003
Filing Date:
November 28, 2001
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
G03F7/039; G03F7/004; G03F7/075; H01L21/336; H01L29/786; H01L51/50; H05B33/10; H05B33/14; (IPC1-7): G03F7/039; G03F7/004; G03F7/075; H01L21/336; H01L29/786; H05B33/10; H05B33/14
Domestic Patent References:
JPH07326235A1995-12-12
JPH0196222A1989-04-14
JPH0792695A1995-04-07
JPS6475529A1989-03-22
JP2000223716A2000-08-11
JP2001250694A2001-09-14
JPH03192362A1991-08-22
JP2001274274A2001-10-05
Attorney, Agent or Firm:
Masayanagi Ueyanagi (2 outside)



 
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