Title:
流体制御されたポンプシステム及び方法
Document Type and Number:
Japanese Patent JP2004537669
Kind Code:
A
Abstract:
A fluid controlled pumping system includes a pumping unit disposed within a fluid cavity. The pumping unit includes a passage extending to a suction end of the pumping unit. The system also includes a pressure source coupled to the passage and operable to force a fluid outwardly from the passage proximate to the suction end of the pumpimg unit. The system includes a pressure sensor coupled to the passage. The system further includes a controller coupled to the pumping unit and operable to regulate an operating parameter of the pumping unit using the fluid pressure. A fluid level controlled pumping system includes a pumping unit disposed within a fluid cavity. The pumping unit includes an inlet operable to receive a fluid to be pumped from the fluid cavity. The system also includes a valve slidably coupled to the pumping unit. The valve includes a passage for receiving pumped fluid from an outlet of the pumping unit. In response to a decreasing fluid level within the fluid cavity, movement of the valve relative to the pumping unit to recirculate the pumped fluid from the outlet to the inlet.
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Inventors:
Zpanic, Joseph A.
Lyall, Monty H
Lyall, Monty H
Application Number:
JP2002583819A
Publication Date:
December 16, 2004
Filing Date:
April 23, 2002
Export Citation:
Assignee:
CDX Gas, LRC
International Classes:
F04C2/16; E21B47/00; F04B15/02; F04B47/02; F04B49/00; F04B49/10; F04C13/00; F04C14/00; F04C14/08; F04C14/24; F04C14/28; F04D15/02; (IPC1-7): F04C15/02; F04B47/02; F04B49/00; F04B49/10; F04C2/16; F04C13/00; F04C15/04
Attorney, Agent or Firm:
Tadahiko Ito
Shinsuke Onuki
Tadashige Ito
Shinsuke Onuki
Tadashige Ito