Title:
FLUORINE-CONTAINING SILICON COMPOUND, PRODUCTION METHOD OF THE SAME, AND PRODUCTION METHOD OF FLUORINE-CONTAINING SILICON RESIN
Document Type and Number:
Japanese Patent JP2016145165
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a silicon-containing composition for forming an intermediate film, which is to be used for microprocessing in a production process of a semiconductor element, and a fluorine-containing silicon compound that is useful as a raw material of a silicon-containing photoresist composition or the like and has good storage stability.SOLUTION: The fluorine-containing silicon compound is represented by general formula (1) below. In the formula, Reach independently represents a hydrocarbon group having 1 to 6 carbon atoms; Reach independently represents a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms; and n represents an integer satisfying 0≤n≤2.SELECTED DRAWING: None
Inventors:
WATANABE TAKESHI
TANEDA YOSHINORI
OGIWARA TSUTOMU
TACHIBANA SEIICHIRO
TANEDA YOSHINORI
OGIWARA TSUTOMU
TACHIBANA SEIICHIRO
Application Number:
JP2015022211A
Publication Date:
August 12, 2016
Filing Date:
February 06, 2015
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
C07F7/18; C08G77/24
Domestic Patent References:
| JP2004256503A | 2004-09-16 | |||
| JP2008209432A | 2008-09-11 | |||
| JP2003007699A | 2003-01-10 | |||
| JP2007217683A | 2007-08-30 | |||
| JP2002100401A | 2002-04-05 | |||
| JP2003098670A | 2003-04-04 |
Foreign References:
| WO2013185021A2 | 2013-12-12 | |||
| US20050196699A1 | 2005-09-08 |
Attorney, Agent or Firm:
Mikio Yoshimiya