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Patent Searching and Data


Title:
FREE-RADICALLY CURABLE RESIN COMPOSITION AND ITS CURING METHOD AND PRODUCTION METHOD
Document Type and Number:
Japanese Patent JP2002338640
Kind Code:
A
Abstract:

To provide a free-radically curable resin composition which can be stored for a long time, is excellent in curing rate, and gives a cured item excellent in physical properties; and its curing method and production method.

This resin composition contains (A) a free-radically curable resin, (B) an N-vinyl compound represented by formula (1) (R1 to R7 are each H or an organic group), and (C) an N-oxyl compound derivative represented by formula (2) (R8 and R9 are each H or an organic group; R10 to R14 are each H or an alkyl; and m is an integer of 1 of higher). The curing method comprises curing the resin composition with an active energy ray.


Inventors:
MIZUTA KEIICHIRO
INOUE RIE
Application Number:
JP2001147830A
Publication Date:
November 27, 2002
Filing Date:
May 17, 2001
Export Citation:
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Assignee:
NIPPON CATALYTIC CHEM IND
International Classes:
C08F290/06; C08F283/01; (IPC1-7): C08F290/06; C08F283/01