Title:
HALOGEN AMINODISILANE COMPOUND, SILICON-CONTAINING THIN FILM FORMING COMPOSITION, AND SILICON-CONTAINING THIN FILM
Document Type and Number:
Japanese Patent JP2022071591
Kind Code:
A
Abstract:
To provide a novel raw material compound applicable to the formation of a silicon-containing thin film using a chemical vapor deposition method.SOLUTION: There is provided a halogen aminodisilane compound represented by the following formula 1, SiAaXbHc-SiAdYeHf, in which A is one of the halogen atoms of F, Cl, Br, and I, and X and Y are alkylamino groups of NHR1 or NR2R3 (R1, R2, and R3 are independently selected linear or branched saturated alkyl groups of 1 to 5C), and a, b, c, d, e and f are integers satisfying the following five formulae. a+b+c=3, d+e+f=3, 1≤a+d≤4, 1≤b+e≤5, and 0≤c+f≤4.SELECTED DRAWING: None
Inventors:
MURATA ITSUHITO
MIZUNO MICHINORI
SUZUKI KATSUMASA
MIZUNO MICHINORI
SUZUKI KATSUMASA
Application Number:
JP2020180635A
Publication Date:
May 16, 2022
Filing Date:
October 28, 2020
Export Citation:
Assignee:
TAIYO NIPPON SANSO CORP
International Classes:
H01L21/318; C07F7/02; C23C16/42; H01L21/31
Attorney, Agent or Firm:
Patent Business Corporation Shiga International Patent Office
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