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Patent Searching and Data


Title:
HEAT DEVELOPING PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JP2002207273
Kind Code:
A
Abstract:

To provide a heat developing photosensitive material in which decrease in the sensitivity and increase in the fog caused by high temperature storage are improved.

(i). In the heat developing photosensitive material having a photosensitive layer containing photosensitive silver halide particles on at least one surface of a supporting body, at least one layer of the photosensitive layer or nonphotosensitive layer contains organic silver salts, a reducing agent and a compound expressed by general formula (1). (ii). In general formula (1) described in (i), X and W are coupled with each other to form a cyclic structure. (iii). The material described in (i) or (ii) further contains a compound expressed by general formula (2). (iv). The material described in (i) to (iii) contains a hydrazine compound.


Inventors:
USAGAWA YASUSHI
HANIYU TAKESHI
TAKAMUKAI YASUHIKO
Application Number:
JP2001003626A
Publication Date:
July 26, 2002
Filing Date:
January 11, 2001
Export Citation:
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Assignee:
KONISHIROKU PHOTO IND
International Classes:
G03C1/498; G03C1/76; (IPC1-7): G03C1/498; G03C1/76