Title:
HEAT TREATMENT FURNACE
Document Type and Number:
Japanese Patent JP2015008202
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To obtain a heat treatment furnace for forming an oxide film on a surface of a wafer and diffusing impurities, which allows a primary boat to travel straight without providing a complicated structure, such as a guide tube, in a furnace core tube of the heat treatment furnace, thereby capable of preventing the dropping of the wafer and the upset of the primary boat.SOLUTION: A heat treatment furnace includes: a furnace core tube 1 disposed to be inclined and performing heat treatment; a tray 7 disposed to be inclined such that the tray is arranged on a straight line with respect to the furnace core tube 1; and a carrying bed 4 mounting a wafer 6 to be subjected to heat treatment thereon and reciprocating between the furnace core tube 1 and the tray 7.
Inventors:
YASUDA KENICHIRO
Application Number:
JP2013132586A
Publication Date:
January 15, 2015
Filing Date:
June 25, 2013
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
H01L21/22; F27B5/12; F27B5/13; H01L21/31; H01L21/683
Attorney, Agent or Firm:
Tadahiko Inaba
Murakami Kanako
Shigeaki Matsui
Yasutaka Kuratani
Murakami Kanako
Shigeaki Matsui
Yasutaka Kuratani
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