Title:
【発明の名称】基板を処理するための装置および方法
Document Type and Number:
Japanese Patent JP2003524296
Kind Code:
A
Abstract:
In order to optimize flow conditions in a device (1) for treating substrates (2) in a treatment basin (3) that is filled with treatment fluid, said device comprising at least one diffusor (12) to introduce the fluid into the treatment basin (3), the distance between the diffusor (12) and the substrates (2) can be regulated. The invention also relates to a method for regulating said distance. According to an additional measure to improve flow conditions in said device, the diffusor (12) has a plate (18) that is curved cylindrically toward the substrates (2) and outlets (20), the cylindrical axes thereof extending perpendicularly in relation to the planes of the substrates.
Inventors:
Torsten Ratke
Klaus Volke
Klaus Volke
Application Number:
JP2001545346A
Publication Date:
August 12, 2003
Filing Date:
December 08, 2000
Export Citation:
Assignee:
Steerg Micro-Tech Gezel Shaft Mitt Beschlenktel Haftung
International Classes:
H01L21/306; H01L21/00; H01L21/304; (IPC1-7): H01L21/306; H01L21/304
Attorney, Agent or Firm:
Toshio Yano (4 outside)