Title:
【発明の名称】イオン・プラズマ型電子銃とその制御方法
Document Type and Number:
Japanese Patent JP3135864
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To stably work in a wide dose range and ensure the uniformity in the width direction of an electron beam by determining a cycle frequency of a plasma pulse on the basis of a desired dose and applying an anode voltage pulse with a constant pulse width to an anode for generating plasma in the cycle frequency. SOLUTION: A high-purity He gas is introduced into a plasma chamber 14 and thermions are supplied to generate plasma 40. The plasma 40 is formed around a wire anode 19. When the He ions produced in such a process pass through a grid 18 and reach the space between the grid 18 and a cathode plate 21, they collide with it by the application of a voltage by a high magnetic field. When He ions with high acceleration energy collide with the cathode plate 21, doubled secondary electrons are generated from it and are accelerated toward the grid 18. The secondary electrons that have penetrated the grid 18 pass through the plasma 40, run through an opening of a window support 15 and reach a window foil 16. A electron beam is made by the secondary electrons that have passed through the window foil 16.
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Inventors:
Hiroki Suezawa
Hirofumi Morimoto
Hirofumi Morimoto
Application Number:
JP13710697A
Publication Date:
February 19, 2001
Filing Date:
May 27, 1997
Export Citation:
Assignee:
Sumitomo Heavy Industries Ltd.
International Classes:
G21K5/10; H01J33/00; H01J37/073; H01J37/075; G21K5/04; (IPC1-7): G21K5/10; G21K5/04; H01J33/00; H01J37/075
Domestic Patent References:
| JP553000A |
Attorney, Agent or Firm:
Keishiro Takahashi (2 outside)