Title:
【発明の名称】微細構造圧印装置及び方法
Document Type and Number:
Japanese Patent JP2871830
Kind Code:
B2
Abstract:
Delicate webs of a motif are to be embossed in a sheet of film (1) at a predetermined motif interval by means of a rotating embossing cylinder (7). The embossing cylinder (7) rolls off on a back pressure cylinder (8) and has a recess (10) for attaching the embossing stencil (12). With each revolution of the embossing cylinder (7), a gap (14) is produced relative to the back pressure cylinder (8) during a free phase, which gap is used for a relative movement between the sheet of film (1) and the embossing stencil (12). A control device (24) produces the relative movement with an adjustable amplitude which is predetermined by the motif interval on the sheet of film (1). This relative movement allows embossing at the predetermined motif interval on the sheet of film (1) irrespective of the diameter of the embossing cylinder (7). The usable length of the embossing stencil (12) is more than 50% of the circumference of the embossing cylinder (7).
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Inventors:
ARETSUKUSU NIFUEREAA
GUREGOORU ANTESU
HANSUIERUKU SHUMITORIN
GUREGOORU ANTESU
HANSUIERUKU SHUMITORIN
Application Number:
JP25042890A
Publication Date:
March 17, 1999
Filing Date:
September 21, 1990
Export Citation:
Assignee:
RANDEISU UNTO GIA BETORIIPUSU AG
International Classes:
B21H7/00; B29C59/04; B41F13/04; B44B5/00; B44B5/02; B29L7/00; (IPC1-7): B29C59/04
Domestic Patent References:
| JP60137651A |
Attorney, Agent or Firm:
Kato Taku