Title:
【発明の名称】トリアミンポジティブフォトレジストストリッピング組成物及びプレベーキング法
Document Type and Number:
Japanese Patent JP2930956
Kind Code:
B2
Abstract:
A process for stripping a positive organic photoresist from a substrate, which comprises prebaking the positive organic photoresist at a temperature in the range of from 150 to 220 DEG C for a period of time of from 15 minutes to 30 minutes, then contacting the positive organic photoresist with a liquid photoresist stripper for the positive organic photoresist for a time sufficient to remove the positive organic photoresist from the substrate.
Inventors:
UEI MUN RII
Application Number:
JP19047588A
Publication Date:
August 09, 1999
Filing Date:
July 29, 1988
Export Citation:
Assignee:
II KEE SHII TEKUNOROJII INC
International Classes:
C11D7/32; G03C11/00; G03F7/00; G03F7/42; H01L21/027; (IPC1-7): G03F7/42
Domestic Patent References:
| JP6249355A | ||||
| JP6295531A |
Attorney, Agent or Firm:
Minoru Nakamura (7 outside)